Title :
CMOS technology for MS/RF SoC
Author :
Diaz, Carlos H. ; Tang, Denny D. ; Sun, Jack
Author_Institution :
Device Eng. Div., Taiwan Semicond. Manuf. Co., Hsinchu, Taiwan
fDate :
3/1/2003 12:00:00 AM
Abstract :
Accelerated scaling of CMOS technology has contributed to remove otherwise fundamental barriers preempting its widespread application to mixed-signal/radio-frequency (MS/RF) segments. Improvements in device speed, matching, and minimum noise figure are all consistent with fundamental scaling trends. Other figures-of-merit such as linearity and 1/f noise do not scale favorably but are not considered to be roadblocks when viewed from a circuit design perspective. Furthermore, interconnect architectural scaling trends in logic technology have facilitated improvements in passive-component performance metrics. These improvements compounded with innovations in circuit design have made CMOS technology the primary choice for cost driven MS/RF applications. This paper reviews active and passive elements of CMOS MS/RF system-on-chip (SoC) technology from a scaling perspective. The paper also discusses the implications that physical phenomena such as mechanical stress and gate leakage as well as gate patterning have on technology definition and characterization.
Keywords :
1/f noise; CMOS integrated circuits; integrated circuit noise; integrated circuit technology; internal stresses; leakage currents; mixed analogue-digital integrated circuits; radiofrequency integrated circuits; system-on-chip; 1/f noise; CMOS mixed-signal/RF SoC; CMOS technology; accelerated scaling; active elements; gate leakage; gate patterning; integrated capacitors; integrated inductors; integrated resistors; interconnect architectural scaling; linearity; mechanical stress; noise figure; passive elements; passive-component performance metrics; radiofrequency SoC; system-on-chip technology; Acceleration; Acoustical engineering; CMOS logic circuits; CMOS technology; Circuit noise; Circuit synthesis; Integrated circuit interconnections; Linearity; Noise figure; Radio frequency;
Journal_Title :
Electron Devices, IEEE Transactions on
DOI :
10.1109/TED.2003.810472