DocumentCode
1213824
Title
Discharge of m.n.o.s. structures
Author
Popova, L.I. ; Vitanov, P.K. ; Antov, B.Z.
Author_Institution
Institute of Microelectronics, Sofia, Bulgaria
Volume
3
Issue
1
fYear
1979
fDate
1/1/1979 12:00:00 AM
Firstpage
17
Lastpage
20
Abstract
The discharge behaviour of m.n.o.s. structures with no applied voltage is investigated at temperatures from ¿¿155¿¿ C to 120¿¿ C for times from 10 to 104s. The decay rate is practically independent of the temperature up to 80¿¿ C but increases significantly at 120¿¿ C. The discharge curves are explained by direct tunnelling from traps, combined with the thermal excitation of these traps. The time dependence of the charge centroid is ascribed to a redistribution of the stored charge in the nitride. A correlation between the decay rate increase after write-erase cycling with the increased nitride conductivity is found.
Keywords
electron traps; integrated memory circuits; metal-insulator-semiconductor structures; semiconductor storage devices; tunnelling; MNOS structures; Si3N4 conduction; discharge behaviour; metal-Si3N4-SiO2-Si structures; temperatures -155 to +120 degree C; thermal excitation; times 10 to 104s; tunnelling;
fLanguage
English
Journal_Title
Solid-State and Electron Devices, IEE Journal on
Publisher
iet
ISSN
0308-6968
Type
jour
DOI
10.1049/ij-ssed.1979.0004
Filename
4807617
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