• DocumentCode
    1213824
  • Title

    Discharge of m.n.o.s. structures

  • Author

    Popova, L.I. ; Vitanov, P.K. ; Antov, B.Z.

  • Author_Institution
    Institute of Microelectronics, Sofia, Bulgaria
  • Volume
    3
  • Issue
    1
  • fYear
    1979
  • fDate
    1/1/1979 12:00:00 AM
  • Firstpage
    17
  • Lastpage
    20
  • Abstract
    The discharge behaviour of m.n.o.s. structures with no applied voltage is investigated at temperatures from ¿¿155¿¿ C to 120¿¿ C for times from 10 to 104s. The decay rate is practically independent of the temperature up to 80¿¿ C but increases significantly at 120¿¿ C. The discharge curves are explained by direct tunnelling from traps, combined with the thermal excitation of these traps. The time dependence of the charge centroid is ascribed to a redistribution of the stored charge in the nitride. A correlation between the decay rate increase after write-erase cycling with the increased nitride conductivity is found.
  • Keywords
    electron traps; integrated memory circuits; metal-insulator-semiconductor structures; semiconductor storage devices; tunnelling; MNOS structures; Si3N4 conduction; discharge behaviour; metal-Si3N4-SiO2-Si structures; temperatures -155 to +120 degree C; thermal excitation; times 10 to 104s; tunnelling;
  • fLanguage
    English
  • Journal_Title
    Solid-State and Electron Devices, IEE Journal on
  • Publisher
    iet
  • ISSN
    0308-6968
  • Type

    jour

  • DOI
    10.1049/ij-ssed.1979.0004
  • Filename
    4807617