DocumentCode
1213868
Title
Voltage measurements on integrated circuits using the scanning electron microscope
Author
Dinnis, A.R.
Author_Institution
University of Edinburgh, Department of Electrical Engineering, Edinburgh, UK
Volume
3
Issue
1
fYear
1979
fDate
1/1/1979 12:00:00 AM
Firstpage
25
Lastpage
28
Abstract
The scanning electron microscope (s.e.m.) is widely used for the topographical examination and X-ray elemental analysis of integrated circuits, and is increasingly being used in electrical contrast modes. The voltage-contrast (v.c.) mode is particularly important because of the small dimensions of the devices found in current l.s.i. circuits which preclude the use of mechanical probes, and because of the minimal circuit loading which the electron beam imposes in high-frequency applications. Voltage contrast can now give a fair degree of measurement accuracy both in the static and dynamic cases. The dynamic situations often require the use of stroboscopic and sampling techniques, where the primary electron beam is chopped at a frequency locked to that of the signal being examined.
Keywords
integrated circuit testing; monolithic integrated circuits; scanning electron microscopy; voltage measurement; LSI; electrical contrast modes; monolithic ICs; scanning electron microscope;
fLanguage
English
Journal_Title
Solid-State and Electron Devices, IEE Journal on
Publisher
iet
ISSN
0308-6968
Type
jour
DOI
10.1049/ij-ssed.1979.0008
Filename
4807621
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