• DocumentCode
    1213868
  • Title

    Voltage measurements on integrated circuits using the scanning electron microscope

  • Author

    Dinnis, A.R.

  • Author_Institution
    University of Edinburgh, Department of Electrical Engineering, Edinburgh, UK
  • Volume
    3
  • Issue
    1
  • fYear
    1979
  • fDate
    1/1/1979 12:00:00 AM
  • Firstpage
    25
  • Lastpage
    28
  • Abstract
    The scanning electron microscope (s.e.m.) is widely used for the topographical examination and X-ray elemental analysis of integrated circuits, and is increasingly being used in electrical contrast modes. The voltage-contrast (v.c.) mode is particularly important because of the small dimensions of the devices found in current l.s.i. circuits which preclude the use of mechanical probes, and because of the minimal circuit loading which the electron beam imposes in high-frequency applications. Voltage contrast can now give a fair degree of measurement accuracy both in the static and dynamic cases. The dynamic situations often require the use of stroboscopic and sampling techniques, where the primary electron beam is chopped at a frequency locked to that of the signal being examined.
  • Keywords
    integrated circuit testing; monolithic integrated circuits; scanning electron microscopy; voltage measurement; LSI; electrical contrast modes; monolithic ICs; scanning electron microscope;
  • fLanguage
    English
  • Journal_Title
    Solid-State and Electron Devices, IEE Journal on
  • Publisher
    iet
  • ISSN
    0308-6968
  • Type

    jour

  • DOI
    10.1049/ij-ssed.1979.0008
  • Filename
    4807621