Title :
Silicon technology tradeoffs for radio-frequency/mixed-signal "systems-on-a-chip"
Author :
Larson, Lawrence E.
Author_Institution :
Electr. & Comput. Eng. Dept., Univ. of California, La Jolla, CA, USA
fDate :
3/1/2003 12:00:00 AM
Abstract :
Silicon technology has progressed over the last several years from a digitally oriented technology to one well suited for microwave and RF applications at a high level of integration. Technology scaling, both at the transistor and back-end metallization level, has driven this progress. CMOS technology is ideally suited for low-noise amplification and receiver applications, but the fundamental breakdown voltage is lower than that of equivalent Si/SiGe HBTs. High-quality passive devices are equally important, and improvements in metallization technology are resulting in higher quality inductors. This paper summarizes the silicon technology issues associated with RF "system-on-a-chip" applications.
Keywords :
BiCMOS integrated circuits; CMOS integrated circuits; elemental semiconductors; heterojunction bipolar transistors; integrated circuit technology; mixed analogue-digital integrated circuits; radiofrequency integrated circuits; silicon; system-on-chip; LNA; RF CMOS technology; RF/mixed-signal SoC; Si; Si/SiGe HBTs; VCO; high-quality passive devices; isolation technologies; metallization technology; monolithic capacitors; monolithic inductors; substrate technologies; systems-on-a-chip; transistor scaling; CMOS technology; Low-noise amplifiers; Optical receivers; Optical transmitters; Radio frequency; Receiving antennas; Silicon; Telephone sets; Transceivers; Wireless communication;
Journal_Title :
Electron Devices, IEEE Transactions on
DOI :
10.1109/TED.2003.810482