• DocumentCode
    1214513
  • Title

    How do hot carriers degrade n-channel MOSFETs?

  • Author

    Mistry, Kaizad ; Doyle, Brian

  • Author_Institution
    Digital Equipment Corp., Hudson, MA, USA
  • Volume
    11
  • Issue
    1
  • fYear
    1995
  • fDate
    1/1/1995 12:00:00 AM
  • Firstpage
    28
  • Lastpage
    33
  • Abstract
    Explores the mechanisms of hot carrier degradation in n-MOSFETs. In addressing the problem of hot carrier degradation, we examine the carrier injection process, whereby electrons and holes are injected into the oxide from the channel. Next, we´ll look at the processes responsible for creating damage. Third, the impact of the damage on the MOSFET´s terminal characteristics is deternined. Then the damage process is modeled. Finally, we´ll address ways to reduce hot carrier degradation
  • Keywords
    MOSFET; hot carriers; semiconductor device models; semiconductor device reliability; N-channel MOSFETs; carrier injection process; damage process; hot carrier degradation; hot carriers; terminal characteristics; Acceleration; Charge carrier processes; Current measurement; Degradation; Electrons; Hot carriers; Impact ionization; Low voltage; MOSFET circuits; Switches;
  • fLanguage
    English
  • Journal_Title
    Circuits and Devices Magazine, IEEE
  • Publisher
    ieee
  • ISSN
    8755-3996
  • Type

    jour

  • DOI
    10.1109/101.340310
  • Filename
    340310