Title :
Integrated polarization beam splitter in high index contrast silicon-on-insulator waveguides
Author :
Liang, T.K. ; Tsang, H.K.
Author_Institution :
Dept. of Electron. Eng., Chinese Univ. of Hong Kong, China
Abstract :
We design, fabricate, and test a novel transverse-electric/transverse-magnetic (TE/TM) polarization beam splitter which is based on the dependence of birefringence on rib width in silicon-on-insulator waveguides. The polarization beam splitter has high TE to TM extinction ratio, low excess loss and wide operation bandwidth. The simple fabrication method involves only single etch step.
Keywords :
birefringence; etching; optical beam splitters; optical design techniques; optical fabrication; optical losses; optical planar waveguides; optical testing; refractive index; rib waveguides; silicon-on-insulator; TE-TM extinction ratio; birefringence; excess loss; index contrast; rib width; silicon-on-insulator waveguides; single etch step; transverse-electric polarization beam splitter; transverse-magnetic polarization beam splitter; Arm; Birefringence; Couplers; Optical device fabrication; Optical polarization; Optical waveguide components; Optical waveguides; Silicon on insulator technology; Stress; Tellurium; Planar waveguides; polarization; waveguide components; waveguides;
Journal_Title :
Photonics Technology Letters, IEEE
DOI :
10.1109/LPT.2004.839462
