• DocumentCode
    121496
  • Title

    Effect of post deposition annealing of printed AlOx film on PERC solar cells

  • Author

    Yung-Sheng Lin ; Jui-Yi Hung ; Tsung-Cheng Chen ; Chen-Hao Ku ; Jung-Ching Wang ; Shian-Wen Chen ; Jen-Jiang Lee ; Ching-Chang Wen

  • Author_Institution
    E-Ton Solar Tech Co., Ltd., Tainan, Taiwan
  • fYear
    2014
  • fDate
    8-13 June 2014
  • Abstract
    AlOx provides excellent passivation on p-type silicon surface and has successfully implemented to high efficiency Passivated Emitter and Rear Cell (PERC) solar cells in recent years. Generally, AlOx is deposited by using plasma enhanced chemical vapor deposition (PECVD) or atomic layer deposition (ALD). In our work, in contrast, a novel printable AlOx paste is applied to form rear passivation layer of PERC cells. In this paper, we focus on illustrating the effect of post deposition annealing (PDA) on PERC cells. Using proper PDA, an average efficiency of 20.0% with the best efficiency of 20.1% is achieved. It demonstrates the feasibility of using this printable AlOx paste. And more important is that this printable AlOx paste can be easily integrated to existing production line with minimum additional capital cost for equipment.
  • Keywords
    annealing; atomic layer deposition; passivation; plasma CVD; solar cells; ALD; PDA; PECVD; PERC solar cells; atomic layer deposition; p-type silicon surface; passivated emitter and rear cell solar cells; plasma enhanced chemical vapor deposition; post deposition annealing; Aluminum oxide; Films; Passivation; Photovoltaic cells; Silicon; Temperature measurement; Aluminum oxide; PERC; paste;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Photovoltaic Specialist Conference (PVSC), 2014 IEEE 40th
  • Conference_Location
    Denver, CO
  • Type

    conf

  • DOI
    10.1109/PVSC.2014.6924997
  • Filename
    6924997