DocumentCode
121496
Title
Effect of post deposition annealing of printed AlOx film on PERC solar cells
Author
Yung-Sheng Lin ; Jui-Yi Hung ; Tsung-Cheng Chen ; Chen-Hao Ku ; Jung-Ching Wang ; Shian-Wen Chen ; Jen-Jiang Lee ; Ching-Chang Wen
Author_Institution
E-Ton Solar Tech Co., Ltd., Tainan, Taiwan
fYear
2014
fDate
8-13 June 2014
Abstract
AlOx provides excellent passivation on p-type silicon surface and has successfully implemented to high efficiency Passivated Emitter and Rear Cell (PERC) solar cells in recent years. Generally, AlOx is deposited by using plasma enhanced chemical vapor deposition (PECVD) or atomic layer deposition (ALD). In our work, in contrast, a novel printable AlOx paste is applied to form rear passivation layer of PERC cells. In this paper, we focus on illustrating the effect of post deposition annealing (PDA) on PERC cells. Using proper PDA, an average efficiency of 20.0% with the best efficiency of 20.1% is achieved. It demonstrates the feasibility of using this printable AlOx paste. And more important is that this printable AlOx paste can be easily integrated to existing production line with minimum additional capital cost for equipment.
Keywords
annealing; atomic layer deposition; passivation; plasma CVD; solar cells; ALD; PDA; PECVD; PERC solar cells; atomic layer deposition; p-type silicon surface; passivated emitter and rear cell solar cells; plasma enhanced chemical vapor deposition; post deposition annealing; Aluminum oxide; Films; Passivation; Photovoltaic cells; Silicon; Temperature measurement; Aluminum oxide; PERC; paste;
fLanguage
English
Publisher
ieee
Conference_Titel
Photovoltaic Specialist Conference (PVSC), 2014 IEEE 40th
Conference_Location
Denver, CO
Type
conf
DOI
10.1109/PVSC.2014.6924997
Filename
6924997
Link To Document