Title :
Effect of post deposition annealing of printed AlOx film on PERC solar cells
Author :
Yung-Sheng Lin ; Jui-Yi Hung ; Tsung-Cheng Chen ; Chen-Hao Ku ; Jung-Ching Wang ; Shian-Wen Chen ; Jen-Jiang Lee ; Ching-Chang Wen
Author_Institution :
E-Ton Solar Tech Co., Ltd., Tainan, Taiwan
Abstract :
AlOx provides excellent passivation on p-type silicon surface and has successfully implemented to high efficiency Passivated Emitter and Rear Cell (PERC) solar cells in recent years. Generally, AlOx is deposited by using plasma enhanced chemical vapor deposition (PECVD) or atomic layer deposition (ALD). In our work, in contrast, a novel printable AlOx paste is applied to form rear passivation layer of PERC cells. In this paper, we focus on illustrating the effect of post deposition annealing (PDA) on PERC cells. Using proper PDA, an average efficiency of 20.0% with the best efficiency of 20.1% is achieved. It demonstrates the feasibility of using this printable AlOx paste. And more important is that this printable AlOx paste can be easily integrated to existing production line with minimum additional capital cost for equipment.
Keywords :
annealing; atomic layer deposition; passivation; plasma CVD; solar cells; ALD; PDA; PECVD; PERC solar cells; atomic layer deposition; p-type silicon surface; passivated emitter and rear cell solar cells; plasma enhanced chemical vapor deposition; post deposition annealing; Aluminum oxide; Films; Passivation; Photovoltaic cells; Silicon; Temperature measurement; Aluminum oxide; PERC; paste;
Conference_Titel :
Photovoltaic Specialist Conference (PVSC), 2014 IEEE 40th
Conference_Location :
Denver, CO
DOI :
10.1109/PVSC.2014.6924997