DocumentCode :
1215436
Title :
Growth and characteristics of GaInAsp/Inp double heterostructure lasers
Author :
Greene, P.D. ; Henshall, G.D.
Author_Institution :
Standard Telecommunication Laboratories Limited, Harlow, UK
Volume :
3
Issue :
6
fYear :
1979
fDate :
11/1/1979 12:00:00 AM
Firstpage :
174
Lastpage :
178
Abstract :
A horizontal furnace system has been developed for growth by liquid-phase epitaxy of multilayer laser structures consisting of InP and (Ga, In) (As, P) incorporating a number of novel features. Double heterostructure lasers emitting at l.3¿¿m with threshold current densities as low as 900 A/cm2have been made. Measurements of the far-field beam angles have allowed the dielectric constant step between the active quaternary and passive layers for lasers emitting at both 1.15 ¿¿m and 1.3 ¿¿m (im, to be deduced. Oxide-insulated stripe-geometry c.w. lasers, operating in a single longitudinal mode, have been made with threshold currents down to 180 mA
Keywords :
III-V semiconductors; gallium arsenide; indium compounds; laser transitions; liquid phase epitaxial growth; semiconductor growth; semiconductor junction lasers; 1.3 mu m; GaInAsP/InP double heterostructure lasers; LPE growth; dielectric constant; far field beam angles; horizontal furnace system; oxide insulated stripe geometry CW lasers; semiconductor growth; threshold current density;
fLanguage :
English
Journal_Title :
Solid-State and Electron Devices, IEE Journal on
Publisher :
iet
ISSN :
0308-6968
Type :
jour
DOI :
10.1049/ij-ssed.1979.0035
Filename :
4807788
Link To Document :
بازگشت