DocumentCode :
1215513
Title :
High-temperature thermal stability performance in /spl delta/-doped In/sub 0.425/Al/sub 0.575/As--In/sub 0.65/Ga/sub 0.35/As metamorphic HEMT
Author :
Wei-Chou Hsu ; Yeong-Jia Chen ; Ching-Sung Lee ; Tzong-Bin Wang ; Yu-Shyan Lin ; Chang-Luen Wu
Author_Institution :
Dept. of Electr. Eng., Nat. Cheng-Kung Univ., Tainan, Taiwan
Volume :
26
Issue :
2
fYear :
2005
Firstpage :
59
Lastpage :
61
Abstract :
We report, to our knowledge, the best high-temperature characteristics and thermal stability of a novel /spl delta/-doped In/sub 0.425/Al/sub 0.575/As--In/sub 0.65/Ga/sub 0.35/As--GaAs metamorphic high-electron mobility transistor. High-temperature device characteristics, including extrinsic transconductance (g/sub m/), drain saturation current density (I/sub DSS/), on/off-state breakdown voltages (BV/sub on//BV/sub GD/), turn-on voltage (V/sub on/), and the gate-voltage swing have been extensively investigated for the gate dimensions of 0.65×200 μm2. The cutoff frequency (fT) and maximum oscillation frequency (fmax), at 300 K, are 55.4 and 77.5 GHz at V/sub DS/=2 V, respectively. Moreover, the distinguished positive thermal threshold coefficient (/spl part/V/sub th///spl part/T) is superiorly as low as to 0.45 mV/K.
Keywords :
III-V semiconductors; aluminium compounds; gallium arsenide; high electron mobility transistors; high-temperature electronics; indium compounds; semiconductor device breakdown; semiconductor doping; thermal stability; /spl delta/-doped metamorphic HEMT; 2 V; 300 K; 55.4 GHz; 77.5 GHz; In/sub 0.425/Al/sub 0.575/As--In/sub 0.65/Ga/sub 0.35/As; InAlAs-InGaAs; cutoff frequency; drain saturation current density; extrinsic transconductance; gate-voltage swing; high-electron mobility transistor; high-temperature device characteristics; high-temperature thermal stability; maximum oscillation frequency; on/off-state breakdown voltages; positive thermal threshold coefficient; Cutoff frequency; Electron mobility; Fabrication; Gallium arsenide; HEMTs; Indium phosphide; MODFETs; Substrates; Thermal stability; mHEMTs; High-temperature; metamorphic; metamorphic high-electron mobility transistor (MHEMT); thermal stability;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2004.841447
Filename :
1386394
Link To Document :
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