DocumentCode :
121576
Title :
Quantitative residual stress imaging of multicrystalline, quasi-mono, and thin kerfless silicon wafers by infrared birefringence and sectioning
Author :
Castellanos, S. ; Buonassisi, Tonio
Author_Institution :
Massachusetts Inst. of Technol., Cambridge, MA, USA
fYear :
2014
fDate :
8-13 June 2014
Abstract :
One of the parameters with highest impact on photovoltaic module cost is manufacturing yield during solar cell production and handling. This work presents a method to quantify residual stress in silicon wafers, through a combination of infrared birefringence imaging (IBI) and sectioning. We spatially resolve and decouple in-plane residual stress components in silicon wafers produced by four different growth methods.
Keywords :
elemental semiconductors; infrared imaging; integrated circuit manufacture; internal stresses; silicon; solar cells; IBI; Si; growth methods; in-plane residual stress components; infrared birefringence; infrared sectioning; manufacturing yield; multicrystalline silicon wafers; photovoltaic module cost; quantitative residual stress imaging; quasimono kerfless silicon wafers; solar cell production; thin kerfless silicon wafers; Imaging; Manufacturing; Residual stresses; Silicon; Spatial resolution; birefringence; imaging; infrared; kerfless silicon; multicrystalline; quasi-mono; residual stress; ribbon; sectioning; silicon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Photovoltaic Specialist Conference (PVSC), 2014 IEEE 40th
Conference_Location :
Denver, CO
Type :
conf
DOI :
10.1109/PVSC.2014.6925077
Filename :
6925077
Link To Document :
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