Title :
Design of Impact Ionization enhanced thin film c-Si HIT solar cells
Author :
Kumar, Vipin ; Nayfeh, Ammar
Author_Institution :
Dept. of Electr. Eng. & Comput. Sci. (EECS), Masdar Inst. of Sci. & Technol., Abu Dhabi, United Arab Emirates
Abstract :
This study investigates the performance of impact ionization (ii) enhanced thin film c-si solar cells using technology computer aided design (tcad) simulations. The effect of ii concerning the electrical and optical properties of the c-si solar cell is carried out. We introduce p+ pocket with a high doping density of the magnitude > 1018 cm-3 to increase the electric field near the junction to values near 1 mv/cm. Using this structure the effect of ii on key solar cell parameters like Jsc, Voc, efficiency and quantum efficiency are investigated. The simulation results show that high doping density of p+ pocket enhances the current density without affecting the voltage. In addition, by varying the doping concentration of the p+ pocket from 1018 cm-3 to 9×1018 cm-3 the current density increases from 18 mA/cm2 to 32 mA/cm2. In addition simulation results also show that internal quantum efficiency (iqe) can reach up to 1.89 with very highly doped p+ pocket (9×1018 cm-3).
Keywords :
current density; electronic engineering computing; elemental semiconductors; ionisation; semiconductor doping; semiconductor thin films; silicon; solar cells; technology CAD (electronics); thin film devices; Si; TCAD simulation; crystalline silicon; current density; doping concentration; electric field; electrical properties; high doping density; impact ionization enhanced thin film HIT solar cell design; optical properties; p+ pocket; quantum efficiency; technology computer aided design simulations; Current density; Doping; Electric fields; Impact ionization; Photovoltaic cells; Semiconductor process modeling; Silicon; Impact Ionization; Internal Quantum Efficiency; Short circuit current density; solar cells; thin film;
Conference_Titel :
Photovoltaic Specialist Conference (PVSC), 2014 IEEE 40th
Conference_Location :
Denver, CO
DOI :
10.1109/PVSC.2014.6925096