DocumentCode
1216127
Title
On the Decomposition of Silane in Plasma Deposition Reactors
Author
DeJoseph, C.A., Jr. ; Haaland, P.d. ; Garscadden, A.
Volume
14
Issue
2
fYear
1986
fDate
4/1/1986 12:00:00 AM
Firstpage
165
Lastpage
172
Abstract
In a low-pressure discharge, plasma-enhanced decomposition of silane proceeds by various channels including electron-impact, ion- and radical-induced, and heterogeneous reactions. The results of several experiments are presented to clarify the relative importance of the processes. The conclusions of these studies and associated analysis are that the dominant processes are strongly influenced by the gas residence time, the power density input, and the electronegative characteristics of the silane discharge.
Keywords
Atomic layer deposition; Electrons; Hydrogen; Inductors; Plasma density; Plasma measurements; Plasma properties; Plasma temperature; Radio frequency; Semiconductor films;
fLanguage
English
Journal_Title
Plasma Science, IEEE Transactions on
Publisher
ieee
ISSN
0093-3813
Type
jour
DOI
10.1109/TPS.1986.4316519
Filename
4316519
Link To Document