DocumentCode :
121656
Title :
Effect of carbon diffusion on performance of thin film c-Si HIT solar cells with a-SiC passivation layer
Author :
Alnuaimi, Aaesha ; Kumar, Vipin ; Chowdhury, Farsad ; Nayfeh, Ammar
Author_Institution :
Dept. of Electr. Eng. & Comput. Sci. (EECS), Masdar Inst. of Sci. & Technol., Abu Dhabi, United Arab Emirates
fYear :
2014
fDate :
8-13 June 2014
Firstpage :
1197
Lastpage :
1200
Abstract :
The effect of carbon diffusion on the performance of c-Si HIT cells with aSi1-xCx:H passivation layer is studied. Two HIT cells are fabricated, one with a-Si passivation layer and one with a-SiC layer. SIMS is used to quantify the carbon diffusion into cSi. The results show a significant amount of carbon at the interface and in the c-Si layer. With the carbon diffusion, the Voc, Jsc and fill factor drop from 0.523V to 0.331V, 24 mA/cm2 to 21 mA/cm2 and from 56% to 21% respectively. In addition, the peak EQE drops by 4%. The dark current increases from 6.24×10-4 mA/cm2 to 3.50×10-3 mA/cm2 at V=-0.5V. Moreover, the results indicate that the carbon diffusion reduces the overall c-Si lifetime in addition to increasing the amount of Dit at the interface.
Keywords :
amorphous semiconductors; passivation; semiconductor thin films; silicon; solar cells; SIMS; Si; carbon diffusion; passivation layer; peak EQE; thin film HIT solar cells; Carbon; Current measurement; Dark current; Passivation; Photovoltaic cells; Silicon; Voltage measurement; amorphous materials; charge carrier lifetime; photovoltaic cells; silicon; silicon carbide;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Photovoltaic Specialist Conference (PVSC), 2014 IEEE 40th
Conference_Location :
Denver, CO
Type :
conf
DOI :
10.1109/PVSC.2014.6925129
Filename :
6925129
Link To Document :
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