• DocumentCode
    121656
  • Title

    Effect of carbon diffusion on performance of thin film c-Si HIT solar cells with a-SiC passivation layer

  • Author

    Alnuaimi, Aaesha ; Kumar, Vipin ; Chowdhury, Farsad ; Nayfeh, Ammar

  • Author_Institution
    Dept. of Electr. Eng. & Comput. Sci. (EECS), Masdar Inst. of Sci. & Technol., Abu Dhabi, United Arab Emirates
  • fYear
    2014
  • fDate
    8-13 June 2014
  • Firstpage
    1197
  • Lastpage
    1200
  • Abstract
    The effect of carbon diffusion on the performance of c-Si HIT cells with aSi1-xCx:H passivation layer is studied. Two HIT cells are fabricated, one with a-Si passivation layer and one with a-SiC layer. SIMS is used to quantify the carbon diffusion into cSi. The results show a significant amount of carbon at the interface and in the c-Si layer. With the carbon diffusion, the Voc, Jsc and fill factor drop from 0.523V to 0.331V, 24 mA/cm2 to 21 mA/cm2 and from 56% to 21% respectively. In addition, the peak EQE drops by 4%. The dark current increases from 6.24×10-4 mA/cm2 to 3.50×10-3 mA/cm2 at V=-0.5V. Moreover, the results indicate that the carbon diffusion reduces the overall c-Si lifetime in addition to increasing the amount of Dit at the interface.
  • Keywords
    amorphous semiconductors; passivation; semiconductor thin films; silicon; solar cells; SIMS; Si; carbon diffusion; passivation layer; peak EQE; thin film HIT solar cells; Carbon; Current measurement; Dark current; Passivation; Photovoltaic cells; Silicon; Voltage measurement; amorphous materials; charge carrier lifetime; photovoltaic cells; silicon; silicon carbide;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Photovoltaic Specialist Conference (PVSC), 2014 IEEE 40th
  • Conference_Location
    Denver, CO
  • Type

    conf

  • DOI
    10.1109/PVSC.2014.6925129
  • Filename
    6925129