• DocumentCode
    1216695
  • Title

    Numerical Simulation of the Flow, Temperature, and Concentration Fields in a Radio Frequency Plasma CVD Reactor

  • Author

    Guo-Ying, Zhao ; Ching-Wen, Zhu

  • Volume
    14
  • Issue
    4
  • fYear
    1986
  • Firstpage
    531
  • Lastpage
    537
  • Abstract
    A mathematical model is presented for the numerical simulation of the flow in a radio frequency (RF) plasma chemical, vapor, and deposition (CVD) reactor. The main parts include a plasma torch (2.5 cm in radius, 22.5 cm long), a reactor (2.5 cm in radius, 20.0 cm long), and a powder collector (4.0 cm in radius, 20 cm long) with a water-cooling tank at the center. The model is based on the solution of two-dimensional continuity, momentum, energy, and species equations in cylindrical coordinates simultaneously with the one-dimensional magnetic and electric-field equations. Detailed knowledge about the velocity, species distributions, and temperature field (both in the flow and in the wall which confines the flow) is obtained by the numerical method SIMPLER of Patankar and Spalding. The effect of some important parameters such as side injection slit width and swirl velocity are investigated. Calculation is made under atmospheric pressure at a power level of 8.4 kW with argon as a heating gas and SiCl4, NH3, H2 as reactants. Owing to the lack of related reaction rate, the chemical reaction and crystallization are not taken into account. Some comments on the flow field in the reactor are made.
  • Keywords
    Chemical vapor deposition; Equations; Inductors; Magnetic confinement; Mathematical model; Numerical simulation; Plasma chemistry; Plasma simulation; Plasma temperature; Radio frequency;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/TPS.1986.4316585
  • Filename
    4316585