Title :
Measurements of unity gain cutoff frequency and saturation velocity of a GaN HEMT transistor
Author :
Oxley, C.H. ; Uren, M.J.
Author_Institution :
De Montfort Univ., Leicester, UK
Abstract :
The measured intrinsic saturation velocity (vsi) of carriers in a gallium nitride (GaN) high electron mobility transistor (HEMT) is very much lower than that predicted using Monte Carlo simulation. A novel method of extraction of the intrinsic saturation velocity (vsi) of carriers has been developed utilising the deembedded s-parameters, thus enabling the calculation of vsi over a wide range of bias conditions. The method is equally applicable for gallium arsenide (GaAs) and indium phosphide (InP) based transistors. The measurements indicate for GaN-based HEMT a maximum deembedded saturation velocity of 1.1×105 m/s close to the pinchoff voltage (VP). It was found that self-heating had only a weak effect on the saturation velocity up to junction temperatures approaching 140°C above ambient.
Keywords :
III-V semiconductors; gallium compounds; high electron mobility transistors; semiconductor device measurement; wide band gap semiconductors; GaN; HEMT transistor; deembedded s-parameters; gallium nitride; heterojunction field-effect transistor; high electron mobility transistor; intrinsic saturation velocity measurement; junction temperature; maximum deembedded saturation velocity; self-heating; unity gain cutoff frequency measurement; Cutoff frequency; Frequency measurement; Gain measurement; Gallium arsenide; Gallium nitride; HEMTs; III-V semiconductor materials; Indium phosphide; Measurement units; Velocity measurement;
Journal_Title :
Electron Devices, IEEE Transactions on
DOI :
10.1109/TED.2004.842719