DocumentCode
121848
Title
Effect of deposition temperature on reactively sputtered CdS:O
Author
Grice, Corey R. ; Paudel, Naba R. ; Chuanxiao Xiao ; Yanfa Yan
Author_Institution
Univ. of Toledo, Toledo, OH, USA
fYear
2014
fDate
8-13 June 2014
Firstpage
1611
Lastpage
1615
Abstract
Thin films of CdS and CdS:O were deposited using RF magnetron sputtering at room temperature and at 270 °C in sputtering ambient with 0-4% O2 (balance Ar). These films were characterized with respect to their optical and structural properties. The samples were then subjected to a heat treatment similar to that experienced during CdTe closed space sublimation deposition, after which the samples were re-characterized.
Keywords
II-VI semiconductors; cadmium compounds; heat treatment; oxygen; semiconductor growth; semiconductor thin films; sputter deposition; wide band gap semiconductors; CdS; CdS:O; RF magnetron sputtering; closed space sublimation deposition; deposition temperature effect; heat treatment; optical properties; reactive sputtering; structural properties; temperature 270 degC; temperature 293 K to 298 K; thin films; Indexes; Magnetic confinement; Magnetic cores; Magnetic properties; Magnetic resonance imaging; Sputtering; Temperature; CdS:O; RF sputtering; oxygenated cadmium sulfide; reactive sputtering; thin films;
fLanguage
English
Publisher
ieee
Conference_Titel
Photovoltaic Specialist Conference (PVSC), 2014 IEEE 40th
Conference_Location
Denver, CO
Type
conf
DOI
10.1109/PVSC.2014.6925228
Filename
6925228
Link To Document