DocumentCode :
1218958
Title :
Electrical characteristics and lifetimes of microdischarge devices having thin dielectric films of aluminum oxide,boron nitride, or barium titanate
Author :
Park, S.-J. ; Eden, J.G.
Author_Institution :
Dept. of Electr. & Comput. Eng., Univ. of Illinois, Urbana, IL, USA
Volume :
39
Issue :
10
fYear :
2003
fDate :
5/15/2003 12:00:00 AM
Firstpage :
773
Lastpage :
775
Abstract :
The electrical (V-I) characteristics, radiative efficiencies, and lifetimes of Ni screen/dielectric/Ni microdischarge devices, having overall thicknesses as small as <100 μm and cylindrical microchannels 50-150 μm in diameter, are investigated for Al2O3, BN, and BaTiO3 dielectric films that are 120 or 200 μm, 30 μm, and 5 μm in thickness, respectively. Having dielectrics fabricated by sol-gel processes or colloidal deposition and operated with Ne gas pressures between 300 and 1200 Torr (300K), these devices operate at voltages as low as ∼93 V (100 μm dia. BaTiO3 device), and exhibit exceptional stability and lifetimes. After 100 h of continuous operation, a Ni screen/30 μm BN/Ni device operating in 700 Torr Ne (static gas fill) at 100 V produces ∼98% of its initial radiant output.
Keywords :
alumina; barium compounds; boron compounds; dielectric thin films; gas-discharge tubes; sol-gel processing; 300 K; 300 to 1200 torr; 93 V; Al2O3; BN; BaTiO3; Ne; Ne gas; Ni; Ni screen/dielectric/Ni microdischarge device; aluminum oxide; barium titanate; boron nitride; colloidal deposition; dielectric thin film; electrical characteristics; lifetime; radiative efficiency; sol-gel processing; stability;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:20030430
Filename :
1204776
Link To Document :
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