DocumentCode :
1221256
Title :
Process design of a novel shielded SBD and its device characteristics
Author :
Sagara, Kazuhiko ; Onai, Takahiro ; Homma, Noriyuki ; Nakamura, Tohru
Author_Institution :
Hitachi Ltd., Tokyo, Japan
Volume :
36
Issue :
9
fYear :
1989
fDate :
9/1/1989 12:00:00 AM
Firstpage :
1853
Lastpage :
1854
Abstract :
A shielded Schottky-barrier diode that has the shielding p-layer between the active n-layer and the n+-buried layer is described. To demonstrate the shielding effect, it is shown experimentally that the maximum collected charge is less than 3/5 that of the conventional Schottky-barrier diode
Keywords :
Schottky-barrier diodes; semiconductor switches; Schottky-barrier diode; active n-layer; device characteristics; fabrication; n+-buried layer; semiconductor switch; shielded SBD; shielding p-layer; Boron; Capacitance; Circuits; Fabrication; Noise generators; Process design; Random access memory; Schottky diodes; Semiconductor films; Silicon;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.34255
Filename :
34255
Link To Document :
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