DocumentCode :
1223660
Title :
Call for papers: ICEAA - IEEE APWC
Author :
Chimenton, Andrea ; Olivo, Piero
Author_Institution :
Dipt. di Ingegneria, Univ. di Ferrara, Italy
Volume :
50
Issue :
4
fYear :
2003
fDate :
4/1/2003 12:00:00 AM
Firstpage :
1015
Lastpage :
1021
Abstract :
For pt.I see ibid., vol.50, pp.1009-14 (2003). This paper presents experimental results about the erratic erase phenomena occurring in Flash Memories with the aim of providing a deeper insight into the physical nature of the phenomenon and to deepen the comprehension of charge trapping/detrapping dynamics in tunnel oxides during Fowler-Nordheim erase. The results obtained under different operating conditions as Program/Erase cycling, Ultra Violet light exposure, thermal stress and the analysis of the erratic erase behavior varying the erasing conditions and the tunnel oxide thickness, suggested also possible methods that can be used in order to reduce the erratic erase phenomena.
Keywords :
flash memories; tunnelling; Fowler-Nordheim erase; charge detrapping; charge trapping; erratic erase; flash memory; program/erase cycling; thermal stress; tunnel oxide; ultraviolet light exposure; Tunneling;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2003.812099
Filename :
1206886
Link To Document :
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