DocumentCode
1223660
Title
Call for papers: ICEAA - IEEE APWC
Author
Chimenton, Andrea ; Olivo, Piero
Author_Institution
Dipt. di Ingegneria, Univ. di Ferrara, Italy
Volume
50
Issue
4
fYear
2003
fDate
4/1/2003 12:00:00 AM
Firstpage
1015
Lastpage
1021
Abstract
For pt.I see ibid., vol.50, pp.1009-14 (2003). This paper presents experimental results about the erratic erase phenomena occurring in Flash Memories with the aim of providing a deeper insight into the physical nature of the phenomenon and to deepen the comprehension of charge trapping/detrapping dynamics in tunnel oxides during Fowler-Nordheim erase. The results obtained under different operating conditions as Program/Erase cycling, Ultra Violet light exposure, thermal stress and the analysis of the erratic erase behavior varying the erasing conditions and the tunnel oxide thickness, suggested also possible methods that can be used in order to reduce the erratic erase phenomena.
Keywords
flash memories; tunnelling; Fowler-Nordheim erase; charge detrapping; charge trapping; erratic erase; flash memory; program/erase cycling; thermal stress; tunnel oxide; ultraviolet light exposure; Tunneling;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/TED.2003.812099
Filename
1206886
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