• DocumentCode
    1223660
  • Title

    Call for papers: ICEAA - IEEE APWC

  • Author

    Chimenton, Andrea ; Olivo, Piero

  • Author_Institution
    Dipt. di Ingegneria, Univ. di Ferrara, Italy
  • Volume
    50
  • Issue
    4
  • fYear
    2003
  • fDate
    4/1/2003 12:00:00 AM
  • Firstpage
    1015
  • Lastpage
    1021
  • Abstract
    For pt.I see ibid., vol.50, pp.1009-14 (2003). This paper presents experimental results about the erratic erase phenomena occurring in Flash Memories with the aim of providing a deeper insight into the physical nature of the phenomenon and to deepen the comprehension of charge trapping/detrapping dynamics in tunnel oxides during Fowler-Nordheim erase. The results obtained under different operating conditions as Program/Erase cycling, Ultra Violet light exposure, thermal stress and the analysis of the erratic erase behavior varying the erasing conditions and the tunnel oxide thickness, suggested also possible methods that can be used in order to reduce the erratic erase phenomena.
  • Keywords
    flash memories; tunnelling; Fowler-Nordheim erase; charge detrapping; charge trapping; erratic erase; flash memory; program/erase cycling; thermal stress; tunnel oxide; ultraviolet light exposure; Tunneling;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2003.812099
  • Filename
    1206886