DocumentCode :
1223841
Title :
A possible explanation for high quantum efficiency of PtSi/porous Si Schottky detectors
Author :
Raissi, Farshid
Author_Institution :
Electr. Eng. Dept., K. N. Toosi Univ. of Technol., Tehran, Iran
Volume :
50
Issue :
4
fYear :
2003
fDate :
4/1/2003 12:00:00 AM
Firstpage :
1134
Lastpage :
1137
Abstract :
P-type PtSi/porous Si Schottky detectors exhibit efficiencies as large as 60% in 2 to 7 μm spectral range. Such efficiencies are larger than theoretical limit for regular PtSi detectors, as predicted by the modified Fowler theory. In the porous detectors a thin PtSi layer covers the walls of the pores creating a Schottky junction with a random surface orientation at any given point with respect to the Si substrate. If we assume that the orientation of the junction surface changes in scales comparable to the mean free path of the photo-excited carriers and incorporate that into the orthodox theory, the chance of transferring excited carriers into the Si substrate increases drastically and the large efficiencies of the porous samples can partially be justified.
Keywords :
Schottky diodes; elemental semiconductors; infrared detectors; platinum; porous semiconductors; silicon; 2 to 7 micron; Fowler theory; IR detectors; PtSi-Si; Schottky detectors; efficiencies; junction surface; mean free path; photo-excited carriers; porous detectors; quantum efficiency; random surface orientation; Avalanche breakdown; Breakdown voltage; Etching; Infrared detectors; Photoelectricity; Radiation detectors; Silicides; Substrates; Surface morphology; Tunneling;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2003.812087
Filename :
1206903
Link To Document :
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