DocumentCode
1224767
Title
Hydrophobic Coatings Obtained in Atmospheric Pressure Plasma
Author
Topala, Ionut ; Asandulesa, Mihai ; Spridon, Delia ; Dumitrascu, Nicoleta
Author_Institution
Fac. of Phys., Alexandru loan Cuza Univ. of Iasi, Iasi
Volume
37
Issue
6
fYear
2009
fDate
6/1/2009 12:00:00 AM
Firstpage
946
Lastpage
950
Abstract
Plasma polymerization at atmospheric pressure is used to obtain stable hydrophobic coatings onto various substrates. Plasma is generated in a dielectric barrier discharge configuration using a mixture of helium gas and styrene vapors. The discharge is characterized by means of electrical measurements and optical emission spectroscopy. Since the styrene vapors introduced in plasma provide a significant decrease of the discharge current, we established the optimum parameters (voltage waveform, gap length, and gas flow rates) for plasma polymerization, assuring a maximum discharge current. The plasma-polymerized films (polystyrene), deposited onto the glass or silicon substrates, are analyzed by contact angle measurements, ellipsometry, IR spectroscopy, and atomic force microscopy (AFM). The film thickness is measured by light interferometry and confirmed by AFM analysis. The water contact angles are higher than 130deg, proving the hydrophobic characteristics of the film, and the refractive index is around 1.5, corresponding to the values of commercial polystyrene.
Keywords
atomic force microscopy; coatings; contact angle; discharges (electric); ellipsometry; infrared spectra; light interferometry; plasma materials processing; polymer films; polymerisation; refractive index; IR spectroscopy; atmospheric pressure plasma; atomic force microscopy; contact angle measurements; dielectric barrier discharge; discharge current; electrical measurements; ellipsometry; film thickness; glass substrate; helium gas vapor; hydrophobic characteristics; hydrophobic coatings; light interferometry; optical emission spectroscopy; plasma polymerization; plasma-polymerized films; polystyrene; refractive index; silicon substrate; styrene vapor; water contact angles; Coatings; materials science and technology; plasma applications; plasma chemical vapor deposition; plasma diagnostics; polymers;
fLanguage
English
Journal_Title
Plasma Science, IEEE Transactions on
Publisher
ieee
ISSN
0093-3813
Type
jour
DOI
10.1109/TPS.2009.2016424
Filename
4810160
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