DocumentCode :
1225830
Title :
A 1-kV 4H-SiC Power DMOSFET Optimized for Low on-Resistance
Author :
Saha, Asmita ; Cooper, James A.
Author_Institution :
Purdue Univ., Lafayette
Volume :
54
Issue :
10
fYear :
2007
Firstpage :
2786
Lastpage :
2791
Abstract :
In this paper we describe a low-voltage (~1 kV) short-channel 4H-SiC power DMOSFET with several structural modifications to reduce the specific on-resistance. These include the following: 1) a heavily doped n-type current-spreading layer beneath the p-base; 2) a heavily-doped JFET region with narrow ( ~1 mum) JFET width; 3) a ldquosegmentedrdquo base contact layout; and 4) tighter alignment tolerances to reduce cell pitch. The design is optimized using computer simulations, and the resulting devices are fabricated and characterized. The fabricated device exhibits a specific on-resistance of 6.95 mOmega-cm2, which is one of the lowest yet reported on-resistances for a power MOSFET in this voltage range.
Keywords :
power MOSFET; silicon compounds; 4H-SiC; computer simulation; fabricated device; heavily doped n-type current-spreading layer; heavily-doped JFET region; low on-resistance; power DMOSFET; segmented base contact layout; voltage 1 kV; Computer simulation; Design optimization; Doping; Electric resistance; Electron mobility; Immune system; MOSFET circuits; Power MOSFET; Silicon carbide; Voltage;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2007.904577
Filename :
4317746
Link To Document :
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