Point defects in lithium fluoride by EUV and soft X-rays exposure for X-ray microscopy and optical applications

The extreme ultraviolet radiation emitted by a laser-plasma source or by a capillary discharge laser is applied to the generation of luminescent patterns in lithium fluoride. This novel technique is able to produce colored patterns with high spatial resolution on large (more than 10 cm²) areas in a short exposure time compared with other irradiation methods like the electron beam writing. The potentials of this technique for applications in photonics are commented. This work reviews the activity performed during the past four years at the ENEA Frascati Center and at L´Aquila University, Italy. Preliminary images of microradiography or X-ray contact microscopy using lithium fluoride as an imaging detector are presented. The advantages of this new detector compared with photographic films or with photoresists are discussed.