Precise Alignment of Single Nanowires and Fabrication of Nanoelectromechanical Switch and Other Test Structures

Author

Li, Qiliang ; Koo, Sang-Mo ; Richter, Curt A. ; Edelstein, Monica D. ; Bonevich, John E. ; Kopanski, Joseph J. ; Suehle, John S. ; Vogel, Eric M.

Author_Institution

Semicond. Electron. Div., Nat. Inst. of Stand. & Technol., Gaithersburg, MD

Volume

6

Issue

2

fYear

2007

fDate

3/1/2007 12:00:00 AM

Firstpage

256

Lastpage

262

Abstract

The integration of nanowires and nanotubes into electrical test structures to investigate their nanoelectronic transport properties is a significant challenge. Here, we present a single nanowire manipulation system to precisely maneuver and align individual nanowires. We show that a single nanowire can be picked up and transferred to a predefined location by electrostatic force. Compatible fabrication processes have been developed to simultaneously pattern multiple aligned nanowires by using one level of photolithography. In addition, we have fabricated and characterized representative devices and test structures including nanoelectromechanical switches with large on/off current ratios, bottom-gated silicon nanowire field-effect transistors, and both transfer-length-method and Kelvin test structures

Keywords

contact resistance; electrostatic devices; field effect transistors; microswitches; nanoelectronics; nanotube devices; nanowires; photolithography; Kelvin test structures; contact resistance; electrical test structures; electrostatic force; nanoelectromechanical switch; nanoelectronic transport properties; nanofabrication process; nanotube devices; nanowire manipulation system; photolithography; silicon nanowire field-effect transistors; transfer length method; Electrostatics; Fabrication; Lithography; Nanoscale devices; Nanostructures; Nanotubes; Nanowires; Silicon; Switches; Testing; Contact resistance; SiNW FET; nanoelectromechanical switch; nanowire alignment; transfer length method;

fLanguage

English

Journal_Title

Nanotechnology, IEEE Transactions on

Publisher

ieee

ISSN

1536-125X

Type

jour

DOI

10.1109/TNANO.2007.891827

Filename

4126520