• DocumentCode
    1228773
  • Title

    Advanced lithography for ULSI

  • Author

    Bokor, J. ; Neureuther, A.R. ; Oldham, W.G.

  • Author_Institution
    Dept. of Electr. Eng. & Comput. Sci., California Univ., Berkeley, CA, USA
  • Volume
    12
  • Issue
    1
  • fYear
    1996
  • fDate
    1/1/1996 12:00:00 AM
  • Firstpage
    11
  • Lastpage
    15
  • Abstract
    Lens technology has advanced to the point where lithographic feature sizes equal to, or even smaller than, the wavelength of the light used in the stepper can be achieved in production. How far optical lithography can go from here depends both on how short a wavelength is possible and how close we can come to the absolute limit of diffraction. In this article, we will examine the current thinking on these questions, and discuss what might happen if and when optical lithography really can no longer be used
  • Keywords
    ULSI; integrated circuit technology; lenses; lithography; ULSI; absolute limit of diffraction; lens technology; lithographic feature sizes; optical lithography; stepper; Focusing; High speed optical techniques; Lenses; Lithography; Optical computing; Optical diffraction; Optical interferometry; Production; Resists; Ultra large scale integration;
  • fLanguage
    English
  • Journal_Title
    Circuits and Devices Magazine, IEEE
  • Publisher
    ieee
  • ISSN
    8755-3996
  • Type

    jour

  • DOI
    10.1109/101.481203
  • Filename
    481203
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1228773