Title :
A Technique for Eliminating Standing Waves and Other Interference Effects in Photoresist
Author :
Lang, Robert J. ; Smilowitz, Bernard
fDate :
5/1/1980 12:00:00 AM
Keywords :
Acoustic waves; Interference elimination; Lithography; Metallization; Optical films; Optical polarization; Optical reflection; Resists; Substrates; Surface acoustic wave devices;
Journal_Title :
Sonics and Ultrasonics, IEEE Transactions on
DOI :
10.1109/T-SU.1980.31163
