Title :
Fabrication of submicrometre parallelogramic-shaped gratings in SiO 2
Author :
Ming Li ; Lin, J.C.H. ; Sheard, Steve John
Author_Institution :
Dept. of Eng. Sci., Oxford Univ.
fDate :
12/8/1994 12:00:00 AM
Abstract :
The fabrication process of submicrometre parallelogramic-shaped gratings is reported, which involves an image reversal resist process and a novel oblique reactive ion etching (RIE) configuration. A submicrometre parallelogramic grating with 40° blaze angle is fabricated using this method
Keywords :
diffraction gratings; optical fabrication; optical waveguide filters; photolithography; silicon compounds; sputter etching; SiO2; fabrication process; grating filters; image reversal resist process; oblique RIE; parallelogramic-shaped gratings; reactive ion etching; submicrometre gratings; submicron gratings;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:19941443
