• DocumentCode
    1229914
  • Title

    The p-Germanium Transistor

  • Author

    Pfann, W.G. ; Scaff, J.H.

  • Author_Institution
    Bell Telephone Laboratories, Inc., Murray Hill, N.J.
  • Volume
    38
  • Issue
    10
  • fYear
    1950
  • Firstpage
    1151
  • Lastpage
    1154
  • Abstract
    The transistor effect in p-type germanium is discussed and some properties are given for p-germanium transistors made in the laboratory. These exhibit higher cutoff frequency and somewhat lower current multiplication than their n-germanium counterparts. Under certain conditions a negative resistance "snap" effect is observed which is apparently peculiar to p-type germanium. Both types of transistor are governed by the same physical principles but they differ in the signs of the emitted carriers and of the bias voltages.
  • Keywords
    Conductivity; Cutoff frequency; Electrodes; Germanium; Laboratories; Lattices; Metal-insulator structures; Semiconductor materials; Silicon; Voltage;
  • fLanguage
    English
  • Journal_Title
    Proceedings of the IRE
  • Publisher
    ieee
  • ISSN
    0096-8390
  • Type

    jour

  • DOI
    10.1109/JRPROC.1950.233109
  • Filename
    1701106