Title :
40nm Ultra-low leakage SRAM at 170 deg.C operation for embedded flash MCU
Author :
Yokoyama, Yoshisato ; Ishii, Y. ; Kojima, H. ; Miyanishi, Astushi ; Tsujihashi, Yoshiki ; Asayama, Shinobu ; Shiba, Kazutoshi ; Tanaka, Kiyoshi ; Fukuda, Toshio ; Nii, Koji ; Yanagisawa, Kei
Abstract :
A 160 kb SRAM macro with stable operation under widely various temperatures of -40 to 170°C is implemented in 40 nm embedded flash CMOS technology for automotive microcontroller applications. We finely optimized MOS sizes of the 6T SRAM bitcell with process tuning to enhance the read margin and to reduce leakage power at high temperatures over 125°C. The optimized bitcell improves the static-noise-margin by 40 mV and reduces leakage power to 1/10 of the conventional value. To achieve high quality, we propose rush current suppression circuit when resuming from sleep-mode and a weak-bit test screening circuit. A designed test chip showed a measured Vmin mean of 0.65 V at 170°C and 1.86 μW/Mb (643 μW/Mb) at 25°C (170°C) with good distribution. Those are the lowest power values reported to date in published works. The estimated leakage power of a prototype MCU chip is acceptable for automotive target specifications.
Keywords :
SRAM chips; automotive electronics; flash memories; low-power electronics; microcontrollers; 6T SRAM bitcell; MOS size optimization; SRAM macro; automotive microcontroller applications; embedded flash CMOS technology; embedded flash MCU; leakage power reduction; process tuning; prototype MCU chip; read margin enhancemrnt; rush current suppression circuit; size 40 nm; sleep-mode; static-noise-margin; temperature -40 degC to 170 degC; temperature 170 degC; ultralow-leakage SRAM; voltage 40 mV; weak-bit test screening circuit; Logic gates; MOS devices; Random access memory; Resistance; Semiconductor device measurement; Temperature distribution; Temperature measurement; 170°C; 40 nm; MCU; SRAM; Standby; leakage power;
Conference_Titel :
Quality Electronic Design (ISQED), 2014 15th International Symposium on
Conference_Location :
Santa Clara, CA
Print_ISBN :
978-1-4799-3945-9
DOI :
10.1109/ISQED.2014.6783302