Title :
Near-infrared channel waveguides formed by electron-beam irradiation of silica layers on silicon substrates
Author :
Syms, R.R.A. ; Tate, T.J. ; Lewandowski, J.J.
Author_Institution :
Dept. of Electr. & Electron. Eng., Imperial Coll. of Sci., Technol. & Med., London, UK
fDate :
12/1/1994 12:00:00 AM
Abstract :
Results are presented for channel guides formed by electron beam irradiation of silica layers formed on Si substrates by plasma-enhanced chemical vapor deposition. Electroplating is shown to be a simple method of fabricating the required surface mask. Optical insertion loss measurements performed at 1.525 μm wavelength show a strong dependence on the irradiation mask width, charge dose, and electron energy, and parameters for low propagation and coupling loss are identified. Optimum propagation losses are 0.4 dB/cm (TE), 0.75 dB/cm (TM). Spectral loss measurements are also presented for as-deposited and thermally annealed material, and it is shown that beneficial results are obtained by annealing before irradiation. The stability of irradiation-induced changes is also described
Keywords :
electroplating; integrated optics; optical couplers; optical loss measurement; optical losses; optical waveguides; plasma CVD; silicon; substrates; 1.525 mum; Si; Si substrates; SiO2-Si; as-deposited; channel guides; charge dose; coupling loss; electron beam irradiation; electron energy; electron-beam irradiation; electroplating; irradiation mask width; irradiation-induced changes; low propagation loss; near-infrared channel waveguides; optical insertion loss measurements; optimum propagation losses; plasma-enhanced chemical vapor deposition; silica layers; silicon substrates; spectral loss measurements; stability; surface mask; thermally annealed material,; Annealing; Electron beams; Loss measurement; Optical losses; Optical waveguides; Plasma chemistry; Plasma measurements; Propagation losses; Silicon compounds; Wavelength measurement;
Journal_Title :
Lightwave Technology, Journal of
