DocumentCode :
1231976
Title :
Development of key components for SIMOX intelligent power LSIs
Author :
Ohno, Tetsufumi ; Matsumoto, Shinichi ; Izumi, Kiyotaka
Author_Institution :
NTT LSI Labs., Kanagawa, Japan
Volume :
25
Issue :
16
fYear :
1989
Firstpage :
1071
Lastpage :
1072
Abstract :
High and low-voltage CMOS/SIMOX and power UMOS/bulk, which are key components for SIMOX intelligent power LSIs, have been developed. A new isolation structure which consists of double buried-oxide layers has been introduced to implement these components on one chip. The concept of the SIMOX power LSI as well as structures, fabrication, and characteristics of the devices are described.
Keywords :
MOS integrated circuits; large scale integration; power integrated circuits; SIMOX intelligent power LSIs; double buried-oxide layers; high-voltage CMOS/SIMOX; isolation structure; low-voltage CMOS/SIMOX; power UMOS/bulk;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19890717
Filename :
35113
Link To Document :
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