• DocumentCode
    1232440
  • Title

    Optical channel waveguides in silicon diffused from GeSi alloy

  • Author

    Schuppert, B. ; Petermann, K.

  • Author_Institution
    Inst. fur Hochfrequenztech., Tech. Univ. Berlin, West Germany
  • Volume
    25
  • Issue
    22
  • fYear
    1989
  • Firstpage
    1500
  • Lastpage
    1502
  • Abstract
    A technique for fabricating low-loss and polarisation-independent channel waveguides in silicon is reported. The waveguides are obtained by Ge-indiffusion using either a GeSi alloy or a system of alternating Ge and Si layers. Typical fabrication parameters for single-mode waveguides are given.
  • Keywords
    Ge-Si alloys; diffusion in solids; optical waveguides; optical workshop techniques; semiconductor materials; Ge-Si alternating layers; Ge-indiffusion; GeSi alloy; channel waveguides; fabrication parameters; low-loss; optical waveguides; polarisation-independent; semiconductors; single-mode waveguides;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:19891007
  • Filename
    35160
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1232440