• DocumentCode
    1232888
  • Title

    Sample-size determination for achieving asymptotic stability of a double EWMA control scheme

  • Author

    Tseng, Sheng-Tsaing ; Hsu, Nan-Jung

  • Author_Institution
    Nat. Tsing Hua Univ., Hsinchu, Taiwan
  • Volume
    18
  • Issue
    1
  • fYear
    2005
  • Firstpage
    104
  • Lastpage
    111
  • Abstract
    The double exponentially weighted moving average (dEWMA) feedback control scheme, a conventional run-to-run control scheme, can adjust certain semiconductor manufacturing processes with a linear drift. The long-term stability conditions for this closed-loop system have received considerable attention in literature. These stability conditions can be expressed in terms of the predicted model assuming that an initial process input-output (I-O) predicted model can be obtained successfully in advance. However, the predicted model is constructed by a random sample of I-O variables, and therefore the strength of the linear relationship between I-O variables plays a major role in determining the validation of these stability conditions. In order to design a stable dEWMA control scheme, the covariance (or correlation) structure of I-O variables and the number of experiments should be simultaneously considered. By controlling a guaranteed probability of stability, this study first derives the formula for an adequate sample size required to construct the predicted model in the case of single-input single-output and multiple-input single-output systems. Illustrative examples demonstrate the effectiveness of the covariance structure of I-O variables in determining the sample size. Implications for research on multiple-input multiple-output systems are also addressed.
  • Keywords
    asymptotic stability; closed loop systems; covariance analysis; electronics industry; feedback; moving average processes; predictive control; process control; semiconductor technology; asymptotic stability; closed-loop system; conventional run-to-run control scheme; covariance structure; double EWMA control scheme; double exponentially weighted moving average feedback control scheme; initial process input-output predicted model; input-output variables random samples; linear drift; multiple-input multiple-output systems; multiple-input single-output systems; sample size determination; semiconductor manufacturing processes; single-input single-output systems; Asymptotic stability; Electrical equipment industry; Feedback control; Linear feedback control systems; MIMO; Manufacturing processes; Predictive models; Process control; Semiconductor device manufacture; Size control;
  • fLanguage
    English
  • Journal_Title
    Semiconductor Manufacturing, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0894-6507
  • Type

    jour

  • DOI
    10.1109/TSM.2004.841833
  • Filename
    1393050