Title :
Wafer-grown heat flux sensor arrays for plasma etch processes
Author :
Freed, Mason ; Krüger, Michiel V P ; Poolla, Kameshwar ; Spanos, Costas J.
Author_Institution :
OnWafer Technol., Dublin, CA, USA
Abstract :
This work treats the design, fabrication, and testing of a wafer-grown thermal flux sensor for use in plasma etch processes. This sensor is capable of separately resolving the heating due to ion flux from that due to surface chemical reactions. The sensor is constructed using a modified Gardon gauge structure with an added antenna structure. This addition allows the exposed portion of the gauge to be formed from any plasma etchable material while still retaining the high sensitivity inherent in a Gargon-type heat flux sensor. The fabrication process for the sensor uses standard MEMS process steps, with an XeF2 postprocess structure release. Bench-top experimental results showing the sensitivity (0.25 μV/W/m2) and repeatibility (8.3 W/m2) are presented and discussed, and preliminary efforts at in situ etch monitoring are discussed.
Keywords :
heat transfer; microsensors; sputter etching; surface chemistry; temperature sensors; Gardon gauge structure; Gargon type heat flux sensor; MEMS process; XeF2 post process structure; antenna structure; bench top experiment; etch monitoring; heating; ion flux; plasma etch process; plasma etchable material; surface chemical reactions; wafer grown heat flux sensor arrays; wafer grown thermal flux sensor fabrication; wafer grown thermal flux sensor testing; Chemical sensors; Etching; Fabrication; Heating; Plasma applications; Plasma chemistry; Sensor arrays; Surface treatment; Testing; Thermal sensors;
Journal_Title :
Semiconductor Manufacturing, IEEE Transactions on
DOI :
10.1109/TSM.2004.840526
