DocumentCode
1233149
Title
The new joint R&D
Author
Ouchi, William G.
Author_Institution
Anderson Graduate Sch. of Manage., California Univ., Los Angeles, CA, USA
Volume
77
Issue
9
fYear
1989
fDate
9/1/1989 12:00:00 AM
Firstpage
1318
Lastpage
1326
Abstract
During the 1980s, a new form of collaborative research and development emerged in Europe, the US, and Japan. In this new form of joint R&D, companies that compete against one another join together for the purpose of creating new process technology in specified domains. This collaboration among competitors is justified for the development of technologies that many companies will ultimately use in a common manner. Such leaky technology typically cannot be effectively protected by patent or other means, and thus will not be developed except through collaborative means, in which those who benefit jointly incur the R&D expense. In Europe and Japan, governments typically provide 50-70% of the cost of such a joint project, while in the United States, government support for joint R&D is just now beginning to become available. The R&D collaboratives are described as being of two types: the secretariat, which is a coordinative body, and the operating entity, which operates its own R&D laboratory facilities. The conditions under which each organizational form appears, as well as the kinds of effort each form typically undertakes, are described
Keywords
research and development management; semiconductor technology; Europe; Japan; US; collaborative research; development; government support; governments; joint R&D; laboratory facilities; operating entity; process technology; secretariat; Collaboration; Costs; Europe; Laboratories; Protection; Research and development; Silicon on insulator technology; Subcontracting; US Government; Wiring;
fLanguage
English
Journal_Title
Proceedings of the IEEE
Publisher
ieee
ISSN
0018-9219
Type
jour
DOI
10.1109/5.35238
Filename
35238
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