• DocumentCode
    1233583
  • Title

    Analysis of CMOS Photodiodes. I. Quantum efficiency

  • Author

    Lee, Ji Soo ; Hornsey, Richard I. ; Renshaw, David

  • Author_Institution
    Univ. of Waterloo, Ont., Canada
  • Volume
    50
  • Issue
    5
  • fYear
    2003
  • fDate
    5/1/2003 12:00:00 AM
  • Firstpage
    1233
  • Lastpage
    1238
  • Abstract
    An improved one-dimensional (1-D) analysis of the CMOS photodiode has been derived in which the effect of the substrate, which forms a high-low junction with the epitaxial layer, has been included. The analytical solution was verified with numerical simulations based on parameters extracted from a standard 0.35 μm CMOS process. Two empirical parameters are suggested to offset the unavoidable inaccuracies in the extracted parameter values. The derived semiempirical expression exhibits a good agreement with the measured spectral response. In Part II of this paper, a three-dimensional (3-D) analysis of lateral photoresponse in CMOS photodiode arrays is presented along with an empirical modeling method utilizing test linear photodiode arrays.
  • Keywords
    CMOS image sensors; photodiodes; semiconductor device models; 0.35 micron; APS; CMOS image sensor; CMOS photodiode; active pixel sensor; edge-effect; epitaxial layer; high-low junction; lateral diffusion; lateral photoresponse; numerical simulations; quantum efficiency; spectral response; CMOS image sensors; CMOS technology; Crosstalk; Epitaxial layers; Numerical simulation; Photodiodes; Pixel; Semiconductor device modeling; Space technology; Substrates;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2003.813232
  • Filename
    1210767