DocumentCode :
1234552
Title :
Influence of epitaxial structure in the noise figure of AlGaN/GaN HEMTs
Author :
Sanabria, Christopher ; Xu, Hongtao ; Palacios, Tomás ; Chakraborty, Arpan ; Heikman, Sten ; Mishra, Umesh K. ; York, Robert A.
Author_Institution :
Electr. & Comput. Eng. Dept., Univ. of California, Santa Barbara, CA
Volume :
53
Issue :
2
fYear :
2005
Firstpage :
762
Lastpage :
769
Abstract :
The effect of noise figure of different AlGaN/GaN high electron-mobility transistor (HEMT) epitaxy structures is reported. The addition of a thin AlN layer between the barrier and channel gives better performance at biasings other than the best for minimum noise figure. However, varying Al composition in the HEMT barrier does not change the noise performance, contrary to a 2003 study by Lu et al. The measurements are checked with both the Pospieszalski and van der Ziel (Pucel) models. The models are used on six different samples, helping to reinforce the measurements and showing the strengths and weaknesses of each
Keywords :
III-V semiconductors; aluminium compounds; gallium compounds; high electron mobility transistors; semiconductor device noise; semiconductor epitaxial layers; wide band gap semiconductors; Al composition; AlGaN-GaN; AlGaN-GaN HEMT; AlN layer; HEMT barrier; Pospieszalski model; Pucel model; epitaxial structure; high electron mobility transistor; noise figure effect; noise performance; van der Ziel model; Aluminum gallium nitride; Frequency; Gallium arsenide; Gallium nitride; HEMTs; Indium phosphide; MODFETs; Noise figure; Noise measurement; Solid state circuits; AlGaN; GaN; Pospieszalski; Pucel; high electron-mobility transistor (HEMT); noise figure; van der Ziel;
fLanguage :
English
Journal_Title :
Microwave Theory and Techniques, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9480
Type :
jour
DOI :
10.1109/TMTT.2004.840578
Filename :
1393223
Link To Document :
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