Title :
New thick-film copper paste for ultra-fine-line circuits
Author :
Ogawa, Tomomi ; Asai, Tadamchi ; Itoh, Osamu ; Hasegawa, Mitoru ; Ikegami, Akira ; Atoh, Kazuhiko ; Kobayashi, Takao
Author_Institution :
Hitachi Ltd., Japan
fDate :
9/1/1989 12:00:00 AM
Abstract :
Key technologies for processing of a thick-film copper conductor applicable to photolithographic techniques are described. A flexo printer was used to obtain a film of less than 2-μm thickness on a substrate. Using photolithographic techniques, fine-line circuits with 40-μm-wide copper conductor lines were realized using copper pastes doped with chalcogens. Dense thin films and good adhesion to the substrate were achieved by doping chalcogens from 0.01 to 0.05 wt.%. Characteristics of these conductor films satisfied the standard requirements for hybrid ICs
Keywords :
chalcogenide glasses; copper; hybrid integrated circuits; photolithography; thick film circuits; 2 micron; 40 micron; adhesion; chalcogens; conductor films; flexo printer; hybrid ICs; key technologies; photolithographic techniques; ultra-fine-line circuits; Conductive films; Copper; Doping; Furnaces; Hybrid integrated circuits; Powders; Printers; Printing; Substrates; Thin film circuits;
Journal_Title :
Components, Hybrids, and Manufacturing Technology, IEEE Transactions on