Title :
Oxidation behavior of AlN in the presence of oxide and glass for thick film applications
Author :
Yamaguchi, Takashi ; Kageyama, Makiko
Author_Institution :
Fac. of Sci. & Technol., Keio Univ., Yokohama, Japan
fDate :
9/1/1989 12:00:00 AM
Abstract :
The effect of oxides and oxide glasses on the oxidation of AlN powder and substrate was studied by thermogravimetric analysis, supplemented by XRD, optical microscopy, and EPMA. The oxidation behavior of powder mixtures of AlN and oxides or glass frits in air was dependent on the oxide species. Oxides were divided into three groups: PbO, CuO, and Bi2O3 promoted the oxidation drastically, ZnO and MgO enhanced the oxidation slightly, and B2 O3 retarded the oxidation of AlN. SiO2 and Al2O3 had no influence on the oxidation. Also reported is a study of the interactions between the AlN substrate and PbO-containing glasses
Keywords :
aluminium compounds; materials testing; oxidation; substrates; thick film circuits; Al2O3; AlN powder oxidation; AlN-Al2O3; AlN-B2O3; AlN-Bi2O3; AlN-CuO; AlN-MgO; AlN-PbO; AlN-SiO2; AlN-ZnO; B2O3; Bi2O3; CuO; EPMA; MgO; PbO; SiO2; TGA; XRD; ZnO; glass frits; optical microscopy; oxidation behavior; oxidation enhancement; oxidation retardation; oxides; thermogravimetric analysis; thick film applications; thick film technology; Glass; Isothermal processes; Oxidation; Powders; Pressure control; Substrates; Temperature distribution; Thick films; Water heating; X-ray scattering;
Journal_Title :
Components, Hybrids, and Manufacturing Technology, IEEE Transactions on
