DocumentCode :
1235574
Title :
Local scalable description of global characteristics of various on-chip asymmetrically octagonal inductors
Author :
Yin, Wen-Yan ; Pan, Shujun J. ; Li, Le-Wei ; Gan, Yeow-Beng ; Lin, Fujiang
Author_Institution :
Temasek Labs., Nat. Univ. of Singapore, Singapore
Volume :
39
Issue :
4
fYear :
2003
fDate :
7/1/2003 12:00:00 AM
Firstpage :
2042
Lastpage :
2048
Abstract :
We present a parametric investigation of various groups of on-chip asymmetrically octagonal inductors on silicon substrates. The inductors have different numbers of turns, strip widths, spacings, outer dimensions, and inner radii. Using two-port S parameters measured by a deembedding technique, we derive some local scalable formulas for extrapolating Q factor, resonance frequency, inductance, overlapping, and oxide capacitances of these octagonal inductors with different geometries. The effects of all geometric parameters on Q factor and so forth are explored, analyzed, and compared with each other in detail.
Keywords :
Q-factor; S-parameters; capacitance; equivalent circuits; inductance; inductors; radiofrequency integrated circuits; silicon; substrates; Q factor; Si; Si substrates; Si-based RFICs; deembedding technique; geometric parameters; global characteristics; inductance; local scalable description; local scalable formulas; on-chip asymmetrically octagonal inductors; oxide capacitances; resonance frequency; two-port S parameters; Capacitance measurement; Frequency measurement; Inductance measurement; Inductors; Q factor; Q measurement; Resonance; Scattering parameters; Silicon; Strips;
fLanguage :
English
Journal_Title :
Magnetics, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9464
Type :
jour
DOI :
10.1109/TMAG.2003.814292
Filename :
1211180
Link To Document :
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