• DocumentCode
    1236398
  • Title

    Minority carrier diffusion length measurements of semiconductors using a multiwavelength laser SQUID microscope

  • Author

    Daibo, Masahiro ; Kikuchi, Toshio ; Yoshizawa, Masahito

  • Author_Institution
    Iwate Ind. Res. Inst., Japan
  • Volume
    13
  • Issue
    2
  • fYear
    2003
  • fDate
    6/1/2003 12:00:00 AM
  • Firstpage
    223
  • Lastpage
    226
  • Abstract
    We evaluated single crystal silicon wafers with a p-n junction structure using a laser superconducting quantum interference device (SQUID) microscope. A high temperature superconductor SQUID magnetometer was used to detect photogenerated magnetic signals with an amplitude of several pico-tesla. The relationship between the photogenerated magnetic fields and the wavelengths of the excitation light was investigated. The minority carrier diffusion length was obtained by using a multiwavelength (680 to 850 nm) laser SQUID microscope. The results were found to be in good agreement with those obtained using the probe contacting method. The laser SQUID microscope can enable a truly noncontacting and contamination-free test of equipment with a high spatial resolution, and can enable testers to make quantitative evaluations. While surface pretreatment is necessary in traditional destructive measurements, the laser SQUID method can be used to take immediate measurements without any required pretreatment. These features make this method highly advantageous for monitoring the semiconductor process.
  • Keywords
    SQUID magnetometers; carrier lifetime; high-temperature superconductors; microscopes; minority carriers; nondestructive testing; probes; semiconductor device testing; 680 to 850 nm; SQUID magnetometer; contamination-free test; high temperature superconductor; laser superconducting quantum interference device; minority carrier diffusion length; multiwavelength laser SQUID microscope; noncontacting test; p-n junction structure; photogenerated magnetic signals; probe contacting method; semiconductor process; spatial resolution; surface pretreatment; High temperature superconductors; Length measurement; Microscopy; P-n junctions; Pollution measurement; SQUIDs; Semiconductor lasers; Silicon; Superconducting devices; Testing;
  • fLanguage
    English
  • Journal_Title
    Applied Superconductivity, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    1051-8223
  • Type

    jour

  • DOI
    10.1109/TASC.2003.813690
  • Filename
    1211582