• DocumentCode
    1237322
  • Title

    SiGe/Si Quantum-Dot Infrared Photodetectors With {bm \\delta } Doping

  • Author

    Lin, Chu-Hsuan ; Yu, Cheng-Ya ; Chang, Chieh-Chun ; Lee, Cheng-Han ; Yang, Ying-Jhe ; Ho, Wei Shuo ; Chen, Yen-Yu ; Liao, Ming Han ; Cho, Chia-Ting ; Peng, Cheng-Yi ; Liu, CheeWee

  • Author_Institution
    Dept. of Electr. Eng., Nat. Taiwan Univ., Taipei
  • Volume
    7
  • Issue
    5
  • fYear
    2008
  • Firstpage
    558
  • Lastpage
    564
  • Abstract
    The multicolor absorption of MOS SiGe/Si quantum-dot (QD) infrared photodetectors is demonstrated using the boron delta-doping in Si spacers. The energy-dispersive X-ray spectroscopy shows that the Ge concentration in the wetting layers is much smaller than that in QDs. Most holes stay at the ground state in QDs instead of wetting layers. The energy band structure in QDs is calculated to understand the absorption spectrum. The absorption at 3.7-6 mum is due to the intersubband transition in the SiGe QDs. The other absorption at 6-16 mu m mainly comes from the intraband transition in the boron delta-doping wells. Since the broadband spectrum covers most of the atmospheric transmission windows for infrared, the broadband detection is feasible using this device.
  • Keywords
    Ge-Si alloys; MIS structures; X-ray chemical analysis; band structure; infrared detectors; photodetectors; semiconductor doping; semiconductor heterojunctions; semiconductor materials; semiconductor quantum dots; SiGe-Si; boron delta-doping; energy band structure; energy-dispersive X-ray spectroscopy; multicolor absorption; quantum-dot infrared photodetectors; $delta$ doping; Delta doping; MOS; QDIP; Quantum dots; SiGe; quantum dots (QDs); quantum-dot infrared photodetector (QDIP);
  • fLanguage
    English
  • Journal_Title
    Nanotechnology, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    1536-125X
  • Type

    jour

  • DOI
    10.1109/TNANO.2008.926353
  • Filename
    4531959