Title :
An SNS technology process for ramp junction based digital superconducting circuits
Author :
Hagedorn, Daniel ; Khabipov, Marat ; Dolata, Ralf ; Buchholz, Friedrich-Immanuel ; Niemeyer, Jürgen
Author_Institution :
Phys. Tech. Bundesanstalt, Braunschweig, Germany
fDate :
6/1/2003 12:00:00 AM
Abstract :
The SNS (Nb/HfTi/Nb) ramp junction technology process has been improved for digital superconducting circuit operation. DC interferometers were realized on an isolated superconducting ground plane, connections being realized through windows in the insulation layers. The inductances of superconducting Nb striplines (widths w down to the sub-μm range) were measured. For a 250 nm SiO2/Nb-oxide insulation layer, the sheet inductances of striplines were determined at 0.382 ± 0.009, 0.340 ± 0.005, and 0.293 ± 0.008 pH (stripline widths: 1.5, 1.0, 0.54 μm) and compared with data calculated by different inductance evaluation programs. The Josephson junctions used in the interferometers exhibit a critical current density of jC=525 kA/cm2 and a characteristic voltage of VC=95 μV. The design of an RSFQ converter circuit was developed on the basis of SNS ramp junction technology. For circuit applications the critical current density jC was set to 150 kA/cm2.
Keywords :
critical current density (superconductivity); hafnium compounds; niobium; superconducting integrated circuits; superconductor-normal-superconductor devices; 1.5 to 0.54 micron; 250 nm; 95 muV; DC interferometers; Josephson junctions; Nb-HfTi-Nb; Nb/HfTi/Nb; RSFQ converter circuit; SNS technology process; characteristic voltage; critical current density; digital superconducting circuits; isolated superconducting ground plane; ramp junction; sheet inductances; striplines; Circuits; Critical current density; Insulation; Interferometers; Isolation technology; Josephson junctions; Niobium; Stripline; Superconducting devices; Superconducting epitaxial layers;
Journal_Title :
Applied Superconductivity, IEEE Transactions on
DOI :
10.1109/TASC.2003.814164