Title :
Fabrication of 64×64 arrayed-waveguide grating multiplexer on silicon
Author :
Okamoto, K. ; Moriwaki, K. ; Suzuki, S.
Author_Institution :
NTT Opto-Electron. Labs., Ibaraki, Japan
fDate :
2/2/1995 12:00:00 AM
Abstract :
A 64 channel arrayed-waveguide multiplexer with 0.4 nm (50 GHz) channel spacing at 1.55 μm has been fabricated using SiO2-Si waveguides. The authors obtained a crosstalk of less than -27 dB to neighbouring and all other channels. The on-chip insertion loss ranges from 3.1 to 5.7 dB for central and peripheral output ports, respectively
Keywords :
diffraction gratings; integrated optics; multiplexing equipment; optical communication equipment; optical crosstalk; optical waveguides; silicon; silicon compounds; wavelength division multiplexing; 1.55 micron; 3.1 to 5.7 dB; 64 channels; 64×64 arrayed-waveguide; SiO2-Si; SiO2-Si waveguides; WDM; arrayed-waveguide grating multiplexer; crosstalk; fabrication; onchip insertion loss;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:19950133
