Title :
Low-Loss and Low-Birefringence High-Contrast Silicon-Oxynitride Waveguides for Optical Communication
Author :
Fadel, Maxim ; Bülters, Mike ; Niemand, Matthias ; Voges, Edgar ; Krummrich, Peter M.
Author_Institution :
NXP Semicond., Hamburg
fDate :
3/15/2009 12:00:00 AM
Abstract :
Silicon-oxynitride waveguides fabricated by plasma-enhanced chemical vapor deposition are very attractive for passive optical components used in optical networks. We use a combination of an high-index contrast and compact core dimensions for the realization of small bending radii. To achieve the high quality requirements with the desired waveguide design the layer deposition and the waveguide fabrication are optimized. Furthermore, we discuss the interface of the high-index optical components to standard single-mode fiber (SSMF) and coupling tolerances, which is more difficult compared to common fiber-mode-matched wave guides. We show results of fabricated Mach-Zehnder interferometer-switches, tunable ring resonators and present a solution to reduce the waveguide birefringence by adjusting the mechanical stress of the cover layer.
Keywords :
Mach-Zehnder interferometers; birefringence; optical communication equipment; optical design techniques; optical fabrication; optical losses; optical resonators; optical waveguides; plasma CVD; silicon compounds; Mach-Zehnder interferometer-switch; SiON; birefringence; fiber coupling; mechanical stress; optical loss; optical networks; plasma-enhanced chemical vapor deposition; ring resonator; silicon-oxynitride waveguides; standard single-mode fiber; Chemical vapor deposition; Design optimization; Optical device fabrication; Optical devices; Optical fiber communication; Optical fiber networks; Optical waveguide components; Optical waveguides; Plasma chemistry; Plasma waves; Birefringence; fiber coupling; optical waveguide; ring resonators; silicon-oxynitride; small bending radii;
Journal_Title :
Lightwave Technology, Journal of
DOI :
10.1109/JLT.2008.928187