DocumentCode
1239491
Title
Innovative high-performance nanowire-grid polarizers and integrated isolators
Author
Wang, J. Jay ; Deng, Jiandong ; Deng, Xuegong ; Liu, Feng ; Sciortino, Paul ; Chen, Lei ; Nikolov, Anguel ; Graham, Alan
Author_Institution
NanoOpto Corp., Somerset, NJ, USA
Volume
11
Issue
1
fYear
2005
Firstpage
241
Lastpage
253
Abstract
We developed a new type of wire-grid polarizer, the so-called nanowire-grid polarizer, which has achieved commercial quality optical performance and reliability. The nanowire-grid polarizer has cores composed of silicon dioxide nanowalls with metal coating on one side. These cores are surrounded by multilayer thin films for antireflection. The core nanowire grid utilizes nano-sized high-aspect ratio dielectric walls as a support for forming a high aspect ratio metal nanowire grid, which significantly reduces energy loss due to metal absorption for the transmitted beam while achieving high extinction ratio for the blocked beam. For all design simulations, we utilized a rigorous coupled-wave analysis and modal method. The nanowire-grid structure was fabricated by a wafer-based nanoreplication lithography and pattern-transfer techniques, which are capable of producing a large-area high aspect ratio nanostructure with high throughput and low cost. The optical performance of the nanowire-grid polarizer was characterized thoroughly. Furthermore, the nanowire-grid polarizer has been integrated monolithically with a Faraday magnetooptic garnet, which results in an integrated semi-isolator. Full free-space isolators based on the integrated semi-isolators have been also developed, which achieved excellent performance, good enough for commercial applications.
Keywords
Faraday effect; garnets; integrated optics; magneto-optical isolators; nanolithography; nanowires; optical polarisers; replica techniques; Faraday magnetooptic garnet; coupled-wave analysis; extinction ratio; integrated isolators; modal method; multilayer thin films; nanowire-grid polarizers; pattern transfer; silicon dioxide nanowalls; wafer-based nanoreplication lithography; Absorption; Coatings; Dielectric losses; Dielectric thin films; Energy loss; Isolators; Nonhomogeneous media; Optical films; Optical polarization; Silicon compounds;
fLanguage
English
Journal_Title
Selected Topics in Quantum Electronics, IEEE Journal of
Publisher
ieee
ISSN
1077-260X
Type
jour
DOI
10.1109/JSTQE.2004.841460
Filename
1395913
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