• DocumentCode
    1239937
  • Title

    Enhanced displacement damage effectiveness in irradiated silicon devices

  • Author

    Srour, J.R. ; Hartmann, R.A.

  • Author_Institution
    Northrop Electron. Syst. Div., Hawthorne, CA, USA
  • Volume
    36
  • Issue
    6
  • fYear
    1989
  • fDate
    12/1/1989 12:00:00 AM
  • Firstpage
    1825
  • Lastpage
    1830
  • Abstract
    Measurements and analyses have been performed to investigate enhanced displacement damage effectiveness in charge-coupled devices irradiated with 14-MeV neutrons and with 100-MeV protons. The thermal activation energies associated with single-particle-induced dark current events are observed to vary over the range 0.3-0.7 eV, with anomalously large events exhibiting relatively small values (≲0.4 eV). The data are described in terms of three mechanisms: conventional thermal generation in moderate-field regions, thermal generation over a reduced barrier in high-field regions, and phonon-assisted tunneling in the latter regions. Data and analyses indicate that the effectiveness of single-particle-induced displacement damage in producing dark current depends on the local electric field strength in the region in which the damage is introduced in a given device. These findings suggest that enhanced displacement damage effects will become more important as integrated circuit geometries are reduced
  • Keywords
    charge-coupled device circuits; electron-phonon interactions; integrated circuit testing; neutron effects; proton effects; tunnelling; 100 MeV; 14 MeV; charge-coupled devices; enhanced displacement damage effectiveness; irradiated Si devices; phonon-assisted tunneling; semiconductor; single-particle-induced dark current; single-particle-induced displacement damage; thermal activation energies; thermal generation; Current measurement; Dark current; Data analysis; Displacement measurement; Neutrons; Performance analysis; Performance evaluation; Protons; Silicon; Tunneling;
  • fLanguage
    English
  • Journal_Title
    Nuclear Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9499
  • Type

    jour

  • DOI
    10.1109/23.45375
  • Filename
    45375