DocumentCode
1241814
Title
Improvement in hard magnetic properties of FePt films by introduction of Ti underlayer
Author
Chen, S.C. ; Kuo, P.C. ; Kuo, S.T. ; Sun, A.C. ; Chou, C.Y. ; Fang, Y.H.
Author_Institution
Dept. of Mech. Eng., De Lin Inst. of Technol., Taipei, Taiwan
Volume
41
Issue
2
fYear
2005
Firstpage
915
Lastpage
917
Abstract
The FePt/Ti double layer films were prepared by dc magnetron sputtering on corning glass substrates with FePt and Ti targets. The Ti underlayer with 100-nm thickness was deposited at substrate temperature 200°C, and the FePt magnetic layer, 300 nm, was prepared at temperature from 200°C to 600°C for direct formation of ordered L10 FePt phase on the Ti underlayer. X-ray diffraction analysis showed that the [002] axis of Ti grain was perpendicular to the film plane and the FePt grains had a preferred growth of (111) plane parallel to the film plane. The degree of ordering of the FePt films increased as Ti underlayer was introduced. Magnetic property measurements indicated that the in-plane coercivities (Hc||) of the FePt/Ti films in which FePt films was deposited at different temperatures were all higher than that of FePt single layer film without Ti underlayer. When the deposition temperature of FePt film was fixed at 600°C, the Hc|| value of the FePt single layer film was 3.1 kOe, and it increased to 7.3 kOe as 100 nm Ti underlayer was introduced.
Keywords
X-ray diffraction; coercive force; magnetic multilayers; magnetic thin films; metallic thin films; platinum alloys; sputtering; thin films; titanium alloys; FePt films; FePt-Ti; Ti underlayer; X-ray diffraction analysis; corning glass substrates; dc magnetron sputtering; double layers film; hard magnetic properties; in-plane coercivities; magnetic property measurements; Coercive force; Magnetic anisotropy; Magnetic films; Magnetic properties; Magnetic recording; Perpendicular magnetic anisotropy; Perpendicular magnetic recording; Sputtering; Substrates; Temperature; FePt/Ti double layers film; Ti underlayer; in-plane coercivity; magnetron sputtering;
fLanguage
English
Journal_Title
Magnetics, IEEE Transactions on
Publisher
ieee
ISSN
0018-9464
Type
jour
DOI
10.1109/TMAG.2004.842092
Filename
1396256
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