• DocumentCode
    1242046
  • Title

    Optical disk groove mastering using an electron beam recorder and chemically amplified resist

  • Author

    Chen, Chien-Yang ; Tsai, Hung-Yin ; Lin, Hung-Yi

  • Author_Institution
    Ind. Technol. Res. Inst., Hsinchu, Taiwan
  • Volume
    41
  • Issue
    2
  • fYear
    2005
  • Firstpage
    1025
  • Lastpage
    1027
  • Abstract
    In order to increase the recording capacity of optical disc, electron beam (EB) mastering technology is used to replace the traditional laser beam mastering technology. Without the optical diffraction limit, EB mastering is one of the most possible candidates that can reach the demand of going beyond 100 GB/layer in capacity of an optical disc. Although this technology can satisfy the requirement of ultra-high recording density, a poor throughput, however, is the main drawback. In our work, a chemically amplified resist, which has much lower required dosage for exposure than the traditional Polymethylmethacrylate resist, was adopted to increase the recording velocity. The stamper of newly announced optical disc, Blu-ray disc (BD, 25-27 GB/layer) and even higher capacity (50 GB) have been successfully manufactured in our work. Because of the advanced technology, it has great possibility that the next generation optical disc, BD and the following ultrahigh-capacity disc will be manufactured by EB mastering technology.
  • Keywords
    electron beam applications; electron resists; optical disc storage; Polymethylmethacrylate resist; chemically amplified resist; electron beam recorder; high-density optical disc; laser beam mastering technology; optical diffraction limit; optical disk groove mastering; ultra-high recording density; Chemical lasers; Chemical technology; Disk recording; Electron beams; Electron optics; Manufacturing; Optical beams; Optical recording; Resists; Stimulated emission; Chemically amplified resist (CAR); electron beam (EB); high-density optical disc; mastering;
  • fLanguage
    English
  • Journal_Title
    Magnetics, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9464
  • Type

    jour

  • DOI
    10.1109/TMAG.2004.842034
  • Filename
    1396289