DocumentCode :
12428
Title :
Proton Radiation-Induced Void Formation in Ni/Au-Gated AlGaN/GaN HEMTs
Author :
Koehler, Andrew D. ; Specht, Petra ; Anderson, Travis J. ; Weaver, Bradley D. ; Greenlee, Jordan D. ; Tadjer, Marko J. ; Porter, Matthew ; Wade, Mark ; Dubon, Oscar C. ; Hobart, Karl D. ; Weatherford, Todd R. ; Kub, Francis J.
Author_Institution :
Naval Res. Lab., Washington, DC, USA
Volume :
35
Issue :
12
fYear :
2014
fDate :
Dec. 2014
Firstpage :
1194
Lastpage :
1196
Abstract :
AlGaN/GaN high-electron mobility transistors (HEMTs) were exposed to 2-MeV protons irradiation, at room temperature, up to a fluence of 6 × 1014 H+/cm2. Aside from degradation resulting from radiation-induced charge trapping, transmission electron microscopy and electrical measurements reveal a radiation-induced defect located at the edges of the Ni/Au Schottky gate in the proton-irradiated devices. At the edges of the Ni/Au gate, the Ni of the Ni/Au gate diffused up into the Au layer and migrated into the AlGaN barrier, leaving voids in the Ni layer at the gate edges after irradiation. These radiation-induced voids are caused by diffusion of Ni through vacancy exchange, known as the Kirkendall effect, resulting in reduced gate area and degrading the HEMT performance.
Keywords :
III-V semiconductors; aluminium compounds; chemical interdiffusion; gallium compounds; gold; high electron mobility transistors; nickel; radiation hardening (electronics); transmission electron microscopy; wide band gap semiconductors; AlGaN-GaN; HEMT performance; Kirkendall effect; Ni-Au; Schottky gate; electrical measurements; electron volt energy 2 MeV; high-electron mobility transistors; proton radiation-induced void formation; proton-irradiated devices; radiation-induced charge trapping; radiation-induced defect; radiation-induced voids; reduced gate area; transmission electron microscopy; vacancy exchange; Aluminum gallium nitride; Gallium nitride; HEMTs; Nickel; Proton radiation effects; Reliability; GaN HEMT; defect; nickel void; nickel void.; proton irradiation; reliability; schottky gate;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2014.2363433
Filename :
6936852
Link To Document :
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